| ATOMIC AND MOLECULAR PHYSICS |
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Laser-Focused Atomic Deposition for Nanascale Grating |
| MA Yan**, LI Tong-Bao, WU Wen, XIAO Yi-Li, ZHANG Ping-Ping, GONG Wei-Gang
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Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Department of Physics, Tongji University, Shanghai 200092
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| Cite this article: |
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MA Yan, LI Tong-Bao, WU Wen et al 2011 Chin. Phys. Lett. 28 073202 |
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Abstract Laser-focused atomic deposition is a technique with which nearly resonant light is used to pattern an atom beam. To solve the problem that the result of laser-cooled atoms cannot be monitored during the 30-min depositing time, we present a three-hole mechanically precollimated aperture apparatus. A 425 nm laser light standing wave is used to focus a beam of chromium atoms to fabricate the nanoscale grating. The period of the grating is 213±0.1 nm, the height is 4 nm and the full width at half miximum is 64±6 nm.
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| Keywords:
32.80.-t
32.80.pj
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Received: 08 July 2010
Published: 29 June 2011
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