| PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
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Lifetime Calculations on Collector Optics from Laser Plasma Extreme Ultraviolet Sources with Minimum Mass |
| WU Tao1,2, WANG Xin-Bing1**
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1Wuhan National Laboratory for Optoelectronics, School of Optoelectronic Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074
2School of Science, Wuhan Institute of Technology, Wuhan 430074
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| Cite this article: |
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WU Tao, WANG Xin-Bing 2011 Chin. Phys. Lett. 28 055201 |
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Abstract An ion flux and its kinetic energy spectrum are obtained using a self similar spherically symmetric fluid model of expansion of a collisionless plasma into vacuum. According to the ion flux and energy distribution, the collector optical lifetime is estimated by knowledge of the sputtering yield of conventional Mo/Si multilayer coatings for the CO2 and Nd:YAG pulsed−laser produced plasmas based on the minimum mass tin droplet target without debris mitigation. The results show that the longer wavelength of the CO2 laser produced plasma light source is more suitable for extreme ultraviolet lithography than Nd:YAG laser in respect of fast ion debris induced sputtering damage to the collector mirror.
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| Keywords:
52.25.Jm
52.38.Kd
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Received: 19 September 2010
Published: 26 April 2011
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| PACS: |
52.25.Jm
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(Ionization of plasmas)
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52.38.Kd
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(Laser-plasma acceleration of electrons and ions)
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