Laser Cleaning Techniques for Removing Surface Particulate Contaminants on Sol-Gel SiO2 Films
ZHANG Chun-Lai1, LI Xi-Bin2, WANG Zhi-Guo1**, LIU Chun-Ming1,2, XIANG Xia1,2, LV Hai-Bing2, YUAN Xiao-Dong2, ZU Xiao-Tao1
1School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054 2Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900
Laser Cleaning Techniques for Removing Surface Particulate Contaminants on Sol-Gel SiO2 Films
ZHANG Chun-Lai1, LI Xi-Bin2, WANG Zhi-Guo1**, LIU Chun-Ming1,2, XIANG Xia1,2, LV Hai-Bing2, YUAN Xiao-Dong2, ZU Xiao-Tao1
1School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054 2Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900
摘要Dry laser cleaning (DLC) and laser shockwave cleaning (LSC) are used to remove the particulate contamination from SiO2 sol−gel optical films. The results show that the LSC with a shockwave initiated by plasma formation under a focused laser beam pulse offers much better efficiency than DLC. Silica particles up to 10 µm on SiO2 films can be removed without substrate damage at a gap distance of 0.5 mm, and a more uniform surface microstructure can be obtained after LSC. Furthermore, it is demonstrated that the transmittance of contaminated SiO2 films can be restored to the as-deposited value after the LSC on dispersed-particle zones. LSC has potential applications in engineering-oriented large components.
Abstract：Dry laser cleaning (DLC) and laser shockwave cleaning (LSC) are used to remove the particulate contamination from SiO2 sol−gel optical films. The results show that the LSC with a shockwave initiated by plasma formation under a focused laser beam pulse offers much better efficiency than DLC. Silica particles up to 10 µm on SiO2 films can be removed without substrate damage at a gap distance of 0.5 mm, and a more uniform surface microstructure can be obtained after LSC. Furthermore, it is demonstrated that the transmittance of contaminated SiO2 films can be restored to the as-deposited value after the LSC on dispersed-particle zones. LSC has potential applications in engineering-oriented large components.
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2011, Vol. 28 
