摘要ZrxCu100-x amorphous films are prepared on Si (111) substrates by magnetron co-sputtering of pure Zr and Cu. It is found that the glass forming ability (GFA) of the films increases with x when x is in the range from 35 to 65 and with the best glass forming ability at x=65. It is therefore different from the bulk counterparts, for which only x=35 and 50 were reported to have high glass forming ability during casting. The structure of the films is sensitive to the substrate temperature and the sputtering argon pressure.
Abstract：ZrxCu100-x amorphous films are prepared on Si (111) substrates by magnetron co-sputtering of pure Zr and Cu. It is found that the glass forming ability (GFA) of the films increases with x when x is in the range from 35 to 65 and with the best glass forming ability at x=65. It is therefore different from the bulk counterparts, for which only x=35 and 50 were reported to have high glass forming ability during casting. The structure of the films is sensitive to the substrate temperature and the sputtering argon pressure.
JING Qin;XU Yong;ZHANG Xin-Yu;LI Gong;LI Li-Xin;XU Zhe;MA Ming-Zhen;LIU Ri-Ping. Zr-Cu Amorphous Films Prepared by Magnetron Co-sputtering Deposition of Pure Zr and Cu[J]. 中国物理快报, 2009, 26(8): 86109-086109.
JING Qin, XU Yong, ZHANG Xin-Yu, LI Gong, LI Li-Xin, XU Zhe, MA Ming-Zhen, LIU Ri-Ping. Zr-Cu Amorphous Films Prepared by Magnetron Co-sputtering Deposition of Pure Zr and Cu. Chin. Phys. Lett., 2009, 26(8): 86109-086109.
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