WANG Wen-Hui1, TANG Yan-Zhe2, WANG Yun-Xiang3, QU Hong-Chang1, WU Ya-Ming1, LI Tie1, YANG Jian-Yi1,2, WANG Yue-Lin1,2, LIU Ming3
1State Key Laboratories of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050
2Department of Information Science and Electronics Engineering, Zhejiang University, Hangzhou 310027
3Microelectronics R&D Centre, Chinese Academy of Sciences, Beijing 100029
WANG Wen-Hui1;TANG Yan-Zhe2;WANG Yun-Xiang3;QU Hong-Chang1;WU Ya-Ming1;LI Tie1;YANG Jian-Yi1,2;WANG Yue-Lin1,2;LIU Ming3
1State Key Laboratories of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050
2Department of Information Science and Electronics Engineering, Zhejiang University, Hangzhou 310027
3Microelectronics R&D Centre, Chinese Academy of Sciences, Beijing 100029
Abstract： A compact optical demultiplexer with etched diffraction grating (EDG) is designed and fabricated on a silicon-on-insulator (SOI) material. Several 90°turning mirrors are used to bend the waveguides, and the size of the EDG-based demultiplexer is minimized to only 16 x 1.7mm2. The crosstalk is about 18 dB. The on-chip loss is about 18.2 dB, which is composed of about 16.9 dB excess loss and 1.3 dB diffraction loss. Measures to improve the performance are discussed.
2004, Vol. 21 
