Highly Directional Emission from a Subwavelength Slit in Metal-Dielectric Layered Films
LI Zu-Bin, TIAN Jian-Guo, ZHOU Wen-Yuan, LIU Zhi-Bo, ZANG Wei-Ping, ZHANG Chun-Ping
The MOE Key Lab of Advanced Technique & Fabrication for Weak-Light Nonlinear Photonics Materials, and Tianjin Key Lab of Photonics Materials & Technology for Information Science, Nankai University, Tianjin 300457
Highly Directional Emission from a Subwavelength Slit in Metal-Dielectric Layered Films
LI Zu-Bin;TIAN Jian-Guo;ZHOU Wen-Yuan;LIU Zhi-Bo;ZANG Wei-Ping;ZHANG Chun-Ping
The MOE Key Lab of Advanced Technique & Fabrication for Weak-Light Nonlinear Photonics Materials, and Tianjin Key Lab of Photonics Materials & Technology for Information Science, Nankai University, Tianjin 300457
Abstract： The directional light emission from a single subwavelength slit surrounded by periodic grooves in layered films consisting of Ag and transparent dielectric is analysed numerically by the finite difference time domain method. The results show that the transmission through this structure is strongly confined by the modulation of the dielectric film with grooves on the output side. The role of evanescent waves in this phenomenon is discussed. It is the re-diffraction of the evanescent waves (that are generated by the diffraction of the subwavelength slit) caused by the grooves on the dielectric film that leads to the directional transmission. Some suggestions are given to obtain beaming light with high transmittance.
2006, Vol. 23 
