摘要Theoretical and interpretative study on the subject of photodetachment of H- near a partially reflecting surface is presented, and the absorption effect of the surface is investigated on the total and differential cross sections using a theoretical imaging method. To understand the absorption effect, a reflection parameter K is introduced as a multiplicative factor to the outgoing detached-electron wave of H- propagating towards the wall. The reflection parameter measures, how much electron wave would reflect from the surface; K=0 corresponds to no reflection and K=1 corresponds to the total reflection.
Abstract：Theoretical and interpretative study on the subject of photodetachment of H- near a partially reflecting surface is presented, and the absorption effect of the surface is investigated on the total and differential cross sections using a theoretical imaging method. To understand the absorption effect, a reflection parameter K is introduced as a multiplicative factor to the outgoing detached-electron wave of H- propagating towards the wall. The reflection parameter measures, how much electron wave would reflect from the surface; K=0 corresponds to no reflection and K=1 corresponds to the total reflection.
A. Afaq. Photodetachment of H- near a Partially Reflecting Surface---I[J]. 中国物理快报, 2008, 25(2): 475-478.
A. Afaq. Photodetachment of H- near a Partially Reflecting Surface---I. Chin. Phys. Lett., 2008, 25(2): 475-478.
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2008, Vol. 25 
