Low-Frequency Relaxation Oscillations in Capacitive Discharge Processes
ZHOU Zhu-Wen1, M. A. LIEBERMAN2, Sungjin KIM2, JI Shi-Yin1, DENG Ming-Sen1, SUN Guang-Yu 1
1Department of Physics, Guizhou Educational College, Guiyang 5500032Department of Electrical Engineering and Computer Sciences-1770, University of California, Berkeley CA 94720, USA
Low-Frequency Relaxation Oscillations in Capacitive Discharge Processes
ZHOU Zhu-Wen1;M. A. LIEBERMAN2;Sungjin KIM2;JI Shi-Yin1;DENG Ming-Sen1;SUN Guang-Yu 1
1Department of Physics, Guizhou Educational College, Guiyang 5500032Department of Electrical Engineering and Computer Sciences-1770, University of California, Berkeley CA 94720, USA
摘要Low-frequency (2.72--3.70Hz) relaxation oscillations at 100mTorr at higher absorbed power were observed from time-varying optical emission of the main discharge chamber and the periphery. We interpret the low frequency oscillations using an electromagnetic model of the slot impedance with parallel connection variational peripheral capacitance, coupled to a circuit analysis of the system including the matching network. The model results are in general agreement with the experimental observations, and indicate a variety of behaviours dependent on the matching conditions.
Abstract:Low-frequency (2.72--3.70Hz) relaxation oscillations at 100mTorr at higher absorbed power were observed from time-varying optical emission of the main discharge chamber and the periphery. We interpret the low frequency oscillations using an electromagnetic model of the slot impedance with parallel connection variational peripheral capacitance, coupled to a circuit analysis of the system including the matching network. The model results are in general agreement with the experimental observations, and indicate a variety of behaviours dependent on the matching conditions.
(Waves, oscillations, and instabilities in plasmas and intense beams)
引用本文:
ZHOU Zhu-Wen;M. A. LIEBERMAN;Sungjin KIM;JI Shi-Yin;DENG Ming-Sen;SUN Guang-Yu. Low-Frequency Relaxation Oscillations in Capacitive Discharge Processes[J]. 中国物理快报, 2008, 25(2): 707-710.
ZHOU Zhu-Wen, M. A. LIEBERMAN, Sungjin KIM, JI Shi-Yin, DENG Ming-Sen, SUN Guang-Yu. Low-Frequency Relaxation Oscillations in Capacitive Discharge Processes. Chin. Phys. Lett., 2008, 25(2): 707-710.
[1]Tsai W, Mueller G, Lindquist R, Frazier B and Vahedi V 1996 J. Vac. Sci. Technol. B 14 3276 [2] Lieberman M A, Lichtenberg A J, Kim Sungjin, Gudmundsson JT, Keil D L and Kim Jisoo 2006 Plasma Sources Sci. Technol. 15 276 [3] Lieberman M A and Lichtenberg A J 2005 Principles ofPlasma Discharges and Materials Processing 2nd edn (New York:Wiley) pp 408--436 [4] Lieberman M A, Booth J P, Chabert P, Rax J M and Turner MM 2002 Plasma Sources Sci. Technol. 11 283 [5] Kim S J, Zhou Z W, Lieberman M A and Lichtenberg A J 2006 J. Appl. Phys. 100 103302 [6] Kim S J, Lieberman M A, Lichtenberg A J and Gudmundsson JT 2006 J. Vac. Sci. Technol. A 24 2025 [7] Zhou Z W, Lieberman M A and Kim S J 2006 Chin. Phys.Lett. 23 2251 [8] Zhou Z W, Lieberman M A and Kim S J 2007 Chin. Phys. 16 758