Adsorption of Oxygen on KxC60 Studied by Photoelectron Spectroscopy
YAO Jun1, LIU Fengqin1, DENG Junzhuo1, XUN Kun2, WANG Zuquan3, LÜ Sihua3, WU Sicheng1,3, JIANG Mingluo4, GU Zhengnan5, ZHOU Xihuang5
1Synchrotron Radiation Laboratory, Institute of High Energy Physics, Academia Sinica, Beijing 100039
2Department of Physics, Yantai University, Yantai 264005
3Department of Physics, Peking University, Beijing 100871
4Institute of Semiconductor, Academia Sinica, Beijing 100083
5Department of Chemistry, Peking University, Beijing 100871
Adsorption of Oxygen on KxC60 Studied by Photoelectron Spectroscopy
1Synchrotron Radiation Laboratory, Institute of High Energy Physics, Academia Sinica, Beijing 100039
2Department of Physics, Yantai University, Yantai 264005
3Department of Physics, Peking University, Beijing 100871
4Institute of Semiconductor, Academia Sinica, Beijing 100083
5Department of Chemistry, Peking University, Beijing 100871
Abstract： Photoemission spectra of vacuum deposited K-incorporated C60–KxC60( x≈6 ) , before and after exposure to oxygen, show that the interaction between oxygen and potassium forms an overlayer of 40Å K-O complex with stoichiometry near to that of potassium peroxide K2O2 on the surface. In contrary to the oxidation of potassium film, no potassium oxide K2O has been observed.
1992, Vol. 9 
