Adsorption and Thermal Decomposition of SiH44 on Cu(111) by Multiple-Scattering Cluster Method
HE Jiang-Ping, TANG Jing-Chang
Department of Physics, State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027
Adsorption and Thermal Decomposition of SiH44 on Cu(111) by Multiple-Scattering Cluster Method
HE Jiang-Ping;TANG Jing-Chang
Department of Physics, State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027
关键词 ：
68.35.Bs ,
61.10.Ht
Abstract ： Adsorption and thermal decomposition of SiH4 on Cu(111) at 110 K has been studied by the calculation of silicon K-edge near edge x-ray absorption fine structure spectra using multiple-scattering cluster method. It is found that the cleavage of Si-H bond yields SiH3 species adsorbed on the fcc 3-fold hollow sites on Cu (111) surface at 110K .
Key words ：
68.35.Bs
61.10.Ht
出版日期: 2000-07-01
引用本文:
HE Jiang-Ping;TANG Jing-Chang. Adsorption and Thermal Decomposition of SiH44 on Cu(111) by Multiple-Scattering Cluster Method[J]. 中国物理快报, 2000, 17(7): 525-527.
4 on Cu(111) by Multiple-Scattering Cluster Method. Chin. Phys. Lett., 2000, 17(7): 525-527.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2000/V17/I7/525
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2000, Vol. 17 
