A Narrow Photoluminescence Linewidth of 19.2 meV at 1.35μm from In0.5 Ga0.5 As/GaAs Quantum Island Structure Grown by Molecular Beam Epitaxy
WANG Xiao-Dong, NIU Zhi-Chuan, FENG Song-Lin, MIAO Zhen-Hua
National Laboratory for Superlattices and Microstructures,
Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083
A Narrow Photoluminescence Linewidth of 19.2 meV at 1.35μm from In0.5 Ga0.5 As/GaAs Quantum Island Structure Grown by Molecular Beam Epitaxy
WANG Xiao-Dong;NIU Zhi-Chuan;FENG Song-Lin;MIAO Zhen-Hua
National Laboratory for Superlattices and Microstructures,
Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083
关键词 :
81.05.Ea ,
68.35.Bs ,
78.66.Fd
Abstract : Self-organized In0.5 Ga0.5 As/GaAs quantum island structure emitting at 1.35μm at room temperature has been successfully fabricated by molecular beam epitaxy via cycled (InAs)1 /(GaAs)1 monolayer deposition method. Photoluminescence measurement shows that a very narrow linewidth of 19.2 meV at 300 K has been reached for the first time, indicating effective suppression of inhomogeneous broadening of optical emission from the In0.5 Ga0.5 As island structure due to indium segregation reduction by introducing an AlAs layer and the strain reduction by inserting an In0.2 Ga0.8 As layer overgrown on the top of islands. The mounds-like morphology of the islands elongated along the [1ī0] azimuth are observed by the atomic force microscopy measurement, which reveals the fact that strain in the islands is partially relaxed along the [1ī0] direction. Our results present important information for the fabrication of 1.3μm wavelength quantum dot devices.
Key words :
81.05.Ea
68.35.Bs
78.66.Fd
出版日期: 2001-04-01
引用本文:
WANG Xiao-Dong;NIU Zhi-Chuan;FENG Song-Lin;MIAO Zhen-Hua. A Narrow Photoluminescence Linewidth of 19.2 meV at 1.35μm from In0.5 Ga0.5 As/GaAs Quantum Island Structure Grown by Molecular Beam Epitaxy[J]. 中国物理快报, 2001, 18(4): 608-610.
WANG Xiao-Dong, NIU Zhi-Chuan, FENG Song-Lin, MIAO Zhen-Hua. A Narrow Photoluminescence Linewidth of 19.2 meV at 1.35μm from In0.5 Ga0.5 As/GaAs Quantum Island Structure Grown by Molecular Beam Epitaxy. Chin. Phys. Lett., 2001, 18(4): 608-610.
链接本文:
https://cpl.iphy.ac.cn/CN/
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https://cpl.iphy.ac.cn/CN/Y2001/V18/I4/608
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