2011, Vol. 28(3): 36105-036105    DOI: 10.1088/0256-307X/28/3/036105
	Influence of Oxygen in Sputtering and Annealing Processes on Properties of ZnO:Ag Films Deposited by rf Sputtering
	DUAN Li1**, GAO Wei2
	1School of Materials Science and Engineering, Chang'an University, Xi'an 710064 2Department of Chemical and Materials Engineering, The University of Auckland, Private Bag 92019, Auckland, New Zealand
	收稿日期 2010-02-08  修回日期 1900-01-01
	Supporting info
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