2008, Vol. 25(3): 1019-1021    DOI:
A Microwave Air Plasma Source under Atmospheric Pressure
LIU Liang, ZHANG Gui-Xin, FENG Jian, WANG Xin-Xin, LUO Cheng-Mu
Department of Electrical Engineering and Applied Electronic Technology, Tsinghua University, Beijing 100084
收稿日期 2007-10-29  修回日期 1900-01-01
Supporting info

[1] Jin Q H, Dai S S and Huang K M 2001 Microwave Chemistry
(Beijing: Science Press) chap 10 p 188 (in Chinese)

[2] Al-Shamma'a A I, Wylie S R and Lucas J 2002 IEEE Trans.
Plasma Sci. 30 1863

[3] Korzec D, Werner F and Winter R 1996 Plasma Sources Sci.
Technol. 5 216

[4] Werner F, Kotzec D and Engemann J 1994 Plasma Sources Sci.
3 473

[5] Roth J R 1995 Industrial Plasma Engineering:
Principles (Bristol: Institute of Physics Publishing)

[6] Liu L, Zhang G X, Zhu Z J and Luo C M 2008 J. Tsinghua
University (Science and Technology) 48 28 (in Chinese)