2009, Vol. 26(4): 46101-046101 DOI: 10.1088/0256-307X/26/4/046101 | ||
Defects in Si-Rich SiO2 Films Prepared by Radio-Frequency Magnetron Co-sputtering Using Variable Energy Positron Annihilation Spectroscopy | ||
HAO Xiao-Peng1, ZHOU Chun-Lan3, WANG Bao-Yi2, WEI Long2 | ||
1Division of Thermometry and Material Evaluation, National Institute of Metrology, Beijing 1000132Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 1000493Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100190 | ||
收稿日期 2009-01-05 修回日期 1900-01-01 | ||
Supporting info | ||
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