2010, Vol. 27(7): 75201-075201 DOI: 10.1088/0256-307X/27/7/075201 | ||
Non-Uniformity of Ion Implantation in Direct-Current Plasma Immersion Ion Implantation | ||
LIU Cheng-Sen1, WANG De-Zhen2, FAN Yu-Jia1, ZHANG Nan1, GUAN Li1, YAO Yuan1 |
||
1College of Physics and Electronic Technology, Liaoning Normal University, Dalian 116029 2State Key Laboratory for Materials Modification by Laser, Ion and Electron Beams, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116023 | ||
收稿日期 2009-07-06 修回日期 1900-01-01 | ||
Supporting info | ||
[1] Conrad J R, Radtke J L, Dodd R A, Worzala F J and Tran N C 1987 J. Appl. Phys. 62 4591 |
||