2008, Vol. 25(1): 202-204    DOI:
A Microfabricated Inductively Coupled Plasma Excitation Source
WANG Yong-Qing1,2, PU Yong-Ni1, SUN Rong-Xia1, TANG Yu-Jun1, CHEN Wen-Jun1, LOU Jian-Zhong1, MA Wen3
1College of Electronic and Informational Engineering, Hebei University, Baoding 0710022Central Iron and Steel Research Institute, National Testing Center of Iron and Steel, Beijing 1000813Chinese People's Armed Police Forces Academy, Langfang 065000
收稿日期 2007-03-02  修回日期 1900-01-01
Supporting info

[1] Ju H and Wu Y H 2001 Optics and Precision
Engineering 9 372 (in Chinese).

[2] Ju H and Wu Y H 2003 Micronanoelectronic Technology
No 1 p 30 (in Chinese)

[3] Ju H and Wu Y H 2001 Chin. J. Scientific Instrument
22 131 (in Chinese)

[4] Wang Y Q, Ma W et al 2006 Metallurgical Analysis
26 40 (in Chinese)

[5] Hopwood J 2000 J. Microelectromech. Systems 9
309

[6]Gu Q Z, Xiang J Z and Yuan X K 1978 The Designs of
Microwave Integrated Circuit (Beijing: Posts and Telecommunications
Press) chap 1.1 (in Chinese)

[7] Hopwood J, Minayeva O and Yin Y 2000 J. Vacuum Sci.
Technol. B: Microelectron. Nanometer Structures 18 2446

[8] Wang Y Q, Ma W, Lou J Z et al 2005 The 7th
International Conference on Electronic Measurement and
Instruments (Beijing 16--18 August 2005)


[9] Yin Y, Messier J and Hopwood J 1999 IEEE Trans.
Plasma Sci. 27 1516

[10] Hopwood J A and McGruer N
http://www.ece.neu.edu/ed\\*snu/hopwood/tampa-proceedings.pdf