Effect of Nickel Distributions Embedded in Amorphous Carbon Films on Transport Properties
Vali Dalouji1** , Dariush Mehrparvar1 , Shahram Solaymani2 , Sahar Rezaee3
1 Department of Physics, Faculty of Science, Malayer University, Malayer, Iran2 Department of Physics, Science and Research Branch, Islamic Azad University, Tehran, Iran3 Department of Physics, Kermanshah Branch, Islamic Azad University, Kermanshah, Iran
Abstract ：Electrical properties of C/Ni films are studied using four mosaic targets made of pure graphite and stripes of nickel with the surface areas of 1.78, 3.21, 3.92 and 4.64%. The conductivity data in the temperature range of 400–500 K shows the extended state conduction. The conductivity data in the temperature range of 150–300 K shows the multi-phonon hopping conduction. The Berthelot-type conduction dominates in the temperature range of 50–150 K. The conductivity of the films in the temperature range about $T < 50$ K is described in terms of variable-range hopping conduction. In low temperatures, the localized density of state around Fermi level $N(E_{\rm F})$ for the film deposition with 3.92% nickel has a maximum value of about $56.2\times10^{17}$ cm$^{-3}$eV$^{-1}$ with the minimum average hopping distance of about $3.43\times10^{-6}$ cm.
收稿日期: 2017-09-26
出版日期: 2018-01-23
:
65.80.-g
(Thermal properties of small particles, nanocrystals, nanotubes, and other related systems)
66.30.Pa
(Diffusion in nanoscale solids)
68.47.Fg
(Semiconductor surfaces)
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2018, Vol. 35 
