Effect of Phantom Dark Energy on Holographic Thermalization
Xiao-Xiong Zeng1,2 , Xin-Yun Hu3** , Li-Fang Li4
1 School of Material Science and Engineering, Chongqing Jiaotong University, Chongqing 4000742 Institute of Theoretical Physics, Chinese Academy of Sciences, Beijing 1001903 School of Economics and Management, Chongqing Jiaotong University, Chongqing 4000744 State Key Laboratory of Space Weather, Center for Space Science and Applied Research, Chinese Academy of Sciences, Beijing 100190
Abstract :Holographic thermalization for a black hole surrounded by phantom dark energy is probed. The result shows that the smaller the phantom dark energy parameter is, the easier the is plasma to thermalize as the chemical potential is fixed, the larger the chemical potential is, and the harder the plasma is to thermalize as the dark energy parameter is fixed. The thermalization velocity and thermalization acceleration are presented by fitting the thermalization curves.
收稿日期: 2016-10-20
出版日期: 2016-12-29
:
04.70.-s
(Physics of black holes)
04.70.Dy
(Quantum aspects of black holes, evaporation, thermodynamics)
04.25.dc
(Numerical studies of critical behavior, singularities, and cosmic censorship)
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