摘要A fluid radio-frequency (rf) sheath model coupled to an equivalent circuit method is adopted to describe the nonlinear series resonance effects due to nonlinear interaction of plasma bulk and sheath in asymmetric capacitive discharges. With the fluid sheath model, we can determine self-consistently the relationship between the instantaneous potential drop across the rf sheath and the instantaneous sheath thickness. The numerical results demonstrate that the self-excitation of the plasma series resonance significantly enhances both ohmic heating and stochastic heating. Also, we observe that the effects of nonlinear series resonance increases the total power dissipation by factors of 2–5 for low pressure capacitive plasmas. Furthermore, we find that the largest harmonic is about 13 for the plasma current.
Abstract：A fluid radio-frequency (rf) sheath model coupled to an equivalent circuit method is adopted to describe the nonlinear series resonance effects due to nonlinear interaction of plasma bulk and sheath in asymmetric capacitive discharges. With the fluid sheath model, we can determine self-consistently the relationship between the instantaneous potential drop across the rf sheath and the instantaneous sheath thickness. The numerical results demonstrate that the self-excitation of the plasma series resonance significantly enhances both ohmic heating and stochastic heating. Also, we observe that the effects of nonlinear series resonance increases the total power dissipation by factors of 2–5 for low pressure capacitive plasmas. Furthermore, we find that the largest harmonic is about 13 for the plasma current.
DAI Zhong-Ling;WANG You-Nian**
. Nonlinear Plasma Dynamics in Electron Heating of Asymmetric Capacitive Discharges with a Fluid Sheath Model[J]. 中国物理快报, 2011, 28(7): 75202-075202.
DAI Zhong-Ling, WANG You-Nian**
. Nonlinear Plasma Dynamics in Electron Heating of Asymmetric Capacitive Discharges with a Fluid Sheath Model. Chin. Phys. Lett., 2011, 28(7): 75202-075202.
[1] Lieberman M A 1988 IEEE Trans. Plasma Sci. 16 638
[2] Turner M M 1995 Phys. Rev. Lett. 75 1312
[3] Lieberman M A and Godyak V A 1998 IEEE Trans. Plasma Sci. 26 955
[4] Gozadinos G, Turner M M and Vender D 2001 Phys. Rev. Lett. 87 135004
[5] Kaganovich I D 2002 Phys. Rev. Lett. 89 265006
[6] Kawamura E, Lieberman M A and Lichtenberg A J 2006 Phys. Plasmas 13 053506
[7] Turner M M and Chabert P 2006 Phys. Rev. Lett. 96 205001
[8] Turner M M and Chabert P 2007 Plasma Sources Sci. Technol. 16 364
[9] Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing 2nd edn (New York: Wiley) pp 396–397
[10] Taillet J 1969 Am. J. Phys. 37 423
[11] Annaratone B M, Ku V P T and Allen J E 1995 J. Appl. Phys. 77 5455
[12] Ku V P T, Annaratone B M and Allen J E 1998 J. Appl. Phys. 84 6536
[13] Qiu W D, Bowers K J and Birdsall C K 2003 Plasma Sources Sci. Technol. 12 57
[14] Czarnetzki U, Mussenbrock T and Brinkmann R P 2006 Phys. Plasmas 13 123503
[15] Mussenbrock T and Brinkmann R P 2006 Appl. Phys. Lett. 88 151503
[16] Mussenbrock T et al 2006 Phys. Plasmas 13 083501
[17] Mussenbrock T and Brinkmann R P 2007 Plasma Sources Sci. Technol. 16 377
[18] Lieberman M A et al 2008 Phys. Plasmas 15 063505
[19] Mussenbrock T et al 2008 Phys. Rev. Lett. 101 085004
[20] Ziegler D et al 2009 Phys. Plasmas 16 023503
[21] Chen F F 1983 Introduction to Plasma Physics and Controlled Fusion 2nd edn (New York: Springer) vol I p 9
2011, Vol. 28 
