摘要Interference nanolithography techniques based on long-range surface plasmon polaritons (LR-SPP) are hardly ever achieved by experiments at present. One key reason is that suitable liquid materials are difficult to find as the match layer connects the metal film and the resist. We redesign a Kretschmann-Raether structure for interference lithography. A polymer layer is coated under the metal film, and an air layer is placed between the polymer layer and the resist layer. This design not only avoids the above-mentioned question of the match layer, but also can form a soft contact between the polymer layer and the resist layer and can protect the exposure pattern. Simulation results confirm that a device with an appropriately thick polymer layer can form high intensity and contrast interference fringes with a critical dimension of about λ/7 in the resist. In addition, the fabrication of the device is very easy.
Abstract：Interference nanolithography techniques based on long-range surface plasmon polaritons (LR-SPP) are hardly ever achieved by experiments at present. One key reason is that suitable liquid materials are difficult to find as the match layer connects the metal film and the resist. We redesign a Kretschmann-Raether structure for interference lithography. A polymer layer is coated under the metal film, and an air layer is placed between the polymer layer and the resist layer. This design not only avoids the above-mentioned question of the match layer, but also can form a soft contact between the polymer layer and the resist layer and can protect the exposure pattern. Simulation results confirm that a device with an appropriately thick polymer layer can form high intensity and contrast interference fringes with a critical dimension of about λ/7 in the resist. In addition, the fabrication of the device is very easy.
WANG Jing-Quan;LIANG Hui-Min;SHI Sha;DU Jing-Lei. Theoretical Analysis of Interference Nanolithography of Surface Plasmon Polaritons without a Match Layer[J]. 中国物理快报, 2009, 26(8): 84208-084208.
WANG Jing-Quan, LIANG Hui-Min, SHI Sha, DU Jing-Lei. Theoretical Analysis of Interference Nanolithography of Surface Plasmon Polaritons without a Match Layer. Chin. Phys. Lett., 2009, 26(8): 84208-084208.
[1] Raether H 1988 Surface Plasmons (Berlin: Spinger) [2] Liu Z W, Wei Q H and Zhang X 2005 Nano Lett. 5957 [3] Luo X G and Ishihara T 2004 Appl. Phys. Lett. 84 4780 [4] Shao D B and Chen S C 2005 Appl. Phys. Lett. 86 253107 [5] Bouhelier A, Ignatovich E, Bruyant A, Huang C, Francs G C,Weeber J C, Dereux A, Wiederrecht G P and Novotny L 2007 Opt.Lett. 32 2535 [6] Srituravanich W, Durant S, Lee H, Sun C and Zhang X 2005 J. Vac. Sci. Technol. B 23 2636 [7] Guo X W, Du J L, Guo Y K and Yao J 2006 Opt. Lett. 31 2613 [8] Bezus E A, Bykov D A, Doskolovich L L and Kadomin I I 2008 J. Opt. A: Pure Appl. Opt. 10 095204 [9] Guo X W, Du J L, Luo X G, Du C L and Guo Y K 2007 Microelectron. Eng. 84 1037 [10] Allione M, Temnov V V, Fedutik Y, Woggon U and Artemyev MV 2008 Nano Lett. 8 31 [11] Lim Y, Kim S, Kim H, Jung J and Lee B 2008 IEEE J. Quant. Electron. 44 305
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