Surface Plasmon Interference Lithography Assisted by a Fabry–Perot Cavity Composed of Subwavelength Metal Grating and Thin Metal Film
LIANG Hui-Min, WANG Jing-Quan** , WANG Xue, WANG Gui-Mei
Hebei University of Engineering, Handan 056038
Abstract ：A surface plasmon interference lithography assisted by a Fabry–Perot (F-P) cavity composed of subwavelength metal gratings and a thin metal film is proposed to fabricate high-quality nanopatterns. The calculated results indicate that uniform straight interference fringes with high contrast and high electric-field intensity are formed in the resist under the F-P cavity. The analyses of spatial frequency spectra illuminate the physical mechanism of the formation for the interference fringes. The influence of the F-P cavity spacing is discussed in detail. Moreover, the error analyses reveal that all parameters except the metal grating period in this scheme can bear large tolerances for the device fabrication.
收稿日期: 2015-03-30
出版日期: 2015-10-30
:
42.82.Cr
(Fabrication techniques; lithography, pattern transfer)
42.79.-e
(Optical elements, devices, and systems)
52.35.Hr
(Electromagnetic waves (e.g., electron-cyclotron, Whistler, Bernstein, upper hybrid, lower hybrid))
[1] Luo X and Ishihara T 2004 Appl. Phys. Lett. 84 4780 2004 J. Vac. Sci. Technol. B 22 3475 2005 Appl. Phys. Lett. 86 253107 2005 J. Vac. Sci. Technol. B 23 2636 2005 Nano Lett. 5 957 2009 J. Opt. A: Pure Appl. Opt. 11 125003 2010 J. Opt. 12 045001 2015 Chin. Phys. B 24 047301 2007 Opt. Lett. 32 2535 2008 J. Opt. A: Pure Appl. Opt. 10 095204 2009 Opt. Lett. 34 845 2006 Opt. Lett. 31 2613 2007 Microelectron. Eng. 84 1037 2008 IEEE J. Quantum Electron. 44 305 2008 Chin. Phys. B 17 2499 2010 J. Vac. Sci. Technol. B 28 128 2010 J. Appl. Phys. 108 113108 2011 Chin. Phys. Lett. 28 018101 2013 Microelectron. Eng. 105 103 2013 J. Appl. Phys. 113 233101 2013 Opt. Commun. 288 122 2015 Appl. Phys. Lett. 106 093110 Plasmonics: Fundamentals and Applications (New York: Springer)1998 Appl. Opt. 37 5271
[1]
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[2]
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[3]
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[4]
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2015, Vol. 32 
