Influences of Annealing on Residual Stress and Structure of HfO2 Films
SHEN Yan-Ming1,2, SHAO Shu-Ying1, DENG Zhen-Xia1,2, HE Hong-Bo1, SHAO Jian-Da1, FAN Zheng-Xiu1
1Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, PO Box 800-211, Shanghai 2018002Graduate School of the Chinese Academy of Sciences, Beijing 100049
Influences of Annealing on Residual Stress and Structure of HfO2 Films
1Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, PO Box 800-211, Shanghai 2018002Graduate School of the Chinese Academy of Sciences, Beijing 100049
摘要HfO2 films are deposited on BK7 glass substrates by electron beam evaporation. The influences of annealing between 100°C and 400°C on residual stresses and structures of HfO2 films are studied. It is found that little differences of spectra, residual stresses and structures are obtained after annealing at lower temperatures. After annealing at higher temperatures, the spectra shift to short wavelength, the residual stress increases with the increasing annealing temperature. At the same time, the crystallite size increases and interplanar distance decreases. The variations of optical spectra and residual stress correspond to the evolutions of structures induced by annealing.
Abstract：HfO2 films are deposited on BK7 glass substrates by electron beam evaporation. The influences of annealing between 100°C and 400°C on residual stresses and structures of HfO2 films are studied. It is found that little differences of spectra, residual stresses and structures are obtained after annealing at lower temperatures. After annealing at higher temperatures, the spectra shift to short wavelength, the residual stress increases with the increasing annealing temperature. At the same time, the crystallite size increases and interplanar distance decreases. The variations of optical spectra and residual stress correspond to the evolutions of structures induced by annealing.
收稿日期: 2007-04-15
出版日期: 2007-09-20
引用本文:
SHEN Yan-Ming;SHAO Shu-Ying;DENG Zhen-Xia;HE Hong-Bo;SHAOJian-Da;FAN Zheng-Xiu. Influences of Annealing on Residual Stress and Structure of HfO2 Films[J]. 中国物理快报, 2007, 24(10): 2963-2966.
SHEN Yan-Ming, SHAO Shu-Ying, DENG Zhen-Xia, HE Hong-Bo, SHAOJian-Da, FAN Zheng-Xiu. Influences of Annealing on Residual Stress and Structure of HfO2 Films. Chin. Phys. Lett., 2007, 24(10): 2963-2966.
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