摘要A new ternary photopolymer system is used in fabricating photonic crystals (PhCs) with controlled defects by combination of single-photon and two-photon photopolymerization. The former process can produce PhCs in one-step recording with a low-power (tens mW) continuous-wave laser at 532nm, while the latter can create desired defects. The preparation of the material, the optical setup and the preliminary experimental results are given. Compared with other methods, this approach is much more accessible and convenient for use of visible light and has advantages of making PhCs in a large scale quickly and economically and introducing any defects exactly, especially for three-dimensional structures.
Abstract：A new ternary photopolymer system is used in fabricating photonic crystals (PhCs) with controlled defects by combination of single-photon and two-photon photopolymerization. The former process can produce PhCs in one-step recording with a low-power (tens mW) continuous-wave laser at 532nm, while the latter can create desired defects. The preparation of the material, the optical setup and the preliminary experimental results are given. Compared with other methods, this approach is much more accessible and convenient for use of visible light and has advantages of making PhCs in a large scale quickly and economically and introducing any defects exactly, especially for three-dimensional structures.
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2007, Vol. 24 
