Microwave Absorption in Electron Cyclotron Resonance Plasma
LIU Ming-Hai1,2, HU Xi-Wei2,WU Qin-Chong1, YU Guo-Yang
1Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031
2Department of Modern Physics, University of Science and Technology of China, Hefei 230026
Microwave Absorption in Electron Cyclotron Resonance Plasma
LIU Ming-Hai1,2;HU Xi-Wei2,WU Qin-Chong1;YU Guo-Yang
1Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031
2Department of Modern Physics, University of Science and Technology of China, Hefei 230026
Abstract： The microwave power absorption in electron cyclotron resonance plasma reactor was investigated with a two-dimensional hybrid-code. Simulation results indicated that there are two typical power deposition profiles over the entire parameter region: (1) microwave power deposition peaks on the axis and decreases in radial direction, (2) microwave power deposition has its maximum at some radial position, i.e., a hollow distribution. The spatial distribution of electron temperature resembles always to the microwave power absorption profile. The dependence of plasma parameter on the gas pressure is discussed also.
2000, Vol. 17 
