Simulation of Chemical Processes in Repetitively Pulsed Atmospheric Plasmas
FANG Tong-Zhen1 , OUYANG Jian-Ming2 , WANG Long1
1 Institute of Physics, Chinese Academy of Sciences, Beijing 100080
2 College of Science, National University of Defense Technology, Changsha 410073
Simulation of Chemical Processes in Repetitively Pulsed Atmospheric Plasmas
FANG Tong-Zhen1 ;OUYANG Jian-Ming2 ;WANG Long1
1 Institute of Physics, Chinese Academy of Sciences, Beijing 100080
2 College of Science, National University of Defense Technology, Changsha 410073
关键词 ：
52.65.-y ,
52.25.Ya ,
82.33.Xj
Abstract ： We numerically simulate the temporal evolutions of the densities of charged and neutral species in a plasma generated with repetitively pulsed discharge in atmospheric environment at 60km altitude. The particles are divided into three categories according to their temporal behaviour. All charged particles exhibit oscillations with the same frequency as the driven power. Densities of elements O, N and H increase in a long-time scale. Densities of O3 and NO increase firstly and then decrease at t=0.65s; in particular, they have very similar density evolution profiles to each other.
Key words ：
52.65.-y
52.25.Ya
82.33.Xj
出版日期: 2005-11-01
:
52.65.-y
(Plasma simulation)
52.25.Ya
(Neutrals in plasmas)
82.33.Xj
(Plasma reactions (including flowing afterglow and electric discharges))
引用本文:
FANG Tong-Zhen;OUYANG Jian-Ming;WANG Long. Simulation of Chemical Processes in Repetitively Pulsed Atmospheric Plasmas[J]. 中国物理快报, 2005, 22(11): 2888-2891.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2005/V22/I11/2888
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