Thermal Annealing of SiO2 Fabricated by Flame Hydrolysis Deposition
ZHANG Le-Tian, XIE Wen-Fa, WU Yuan-Da, XING Hua, LI Ai-Wu, ZHENG Wei, ZHANG Yu-Shu
National Integrated Optoelectronics Laboratory, Jilin University, Changchun 130023
Thermal Annealing of SiO2 Fabricated by Flame Hydrolysis Deposition
ZHANG Le-Tian;XIE Wen-Fa;WU Yuan-Da;XING Hua;LI Ai-Wu;ZHENG Wei;ZHANG Yu-Shu
National Integrated Optoelectronics Laboratory, Jilin University, Changchun 130023
关键词 ：
78.66.Jg ,
78.20.Ci
Abstract ： Amorphous SiO2 films were fabricated on Si substrates by flame hydrolysis deposition as buffer layers applied in the planar optical waveguides. Then the Si wafers with the porous particles were put into electric furnace annealing at different temperatures for consolidation in air. The products were characterized by x-ray diffraction, x-ray2 is continuous and dense and the refractive index at 1550 nm is 1.4564, which is highly desirable.
Key words ：
78.66.Jg
78.20.Ci
出版日期: 2003-08-01
:
78.66.Jg
(Amorphous semiconductors; glasses)
78.20.Ci
(Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity))
引用本文:
ZHANG Le-Tian;XIE Wen-Fa;WU Yuan-Da;XING Hua;LI Ai-Wu;ZHENG Wei;ZHANG Yu-Shu. Thermal Annealing of SiO2 Fabricated by Flame Hydrolysis Deposition[J]. 中国物理快报, 2003, 20(8): 1366-1368.
2 Fabricated by Flame Hydrolysis Deposition. Chin. Phys. Lett., 2003, 20(8): 1366-1368.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2003/V20/I8/1366
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2003, Vol. 20 
