X-Ray Nonspecular Scattering from Amorphous Mo Films

X-ray nonspecular scattering method is used to study the structures of Mo thin films fabricated with magnetron sputtering under different Ar pressures. The results show that with the increase of Ar pressure, the density of amorphous Mo film decreased; the surface roughness of the films increased, while the surface coherent length decreased. The abnormal glow discharging in the sputtering processes interprets the observed results well.