Structure Properties of Mg_xZn_1-xO Films Deposited at Low Temperature

Mg_xZn_1-xO films (x=0.23) have been prepared on silicon substrates by radio-frequency magnetron sputtering at 80°C. The structure properties of Mg_xZn_1-xO films are studied using x-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), x-ray photoelectron spectroscopy and Raman spectra. The analysis of XRD and HRTEM indicates that the Mg_xZn_1-xO films have hexagonal wurtzite single-phase structures and a preferred orientation with the c axis perpendicular to the substrates. Raman spectra of ZnO and Mg_xZn_1-xO films reveal that the Mg_xZn_1-xO films have not only the hexagonal wurtzite structure but also higher crystalline quality than ZnO films.