Random-Like Deposition Model of Surface Growth Kinetics
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Abstract
The surface growth kinetics of random-like deposition model with two kinds of particles (A and C) is studied. The scaling behavior of the surface width is obtained for various deposition probabilities of particle C and system sizes. We also found a change of different morphologic structures which results from the diffusion of particle C.
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Cite this article:
WANG Wei, Hilda A. Cerdeira. Random-Like Deposition Model of Surface Growth Kinetics[J]. Chin. Phys. Lett., 1995, 12(12): 755-758.
WANG Wei, Hilda A. Cerdeira. Random-Like Deposition Model of Surface Growth Kinetics[J]. Chin. Phys. Lett., 1995, 12(12): 755-758.
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WANG Wei, Hilda A. Cerdeira. Random-Like Deposition Model of Surface Growth Kinetics[J]. Chin. Phys. Lett., 1995, 12(12): 755-758.
WANG Wei, Hilda A. Cerdeira. Random-Like Deposition Model of Surface Growth Kinetics[J]. Chin. Phys. Lett., 1995, 12(12): 755-758.
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