Atom Lithography with a Chromium Atomic Beam

Direct write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms deposit on the substrate. We design an experiment setup to fabricate chromium nanolines by depositing an atomic beam of ⁵²Cr through an off-resonant laser standing wave with the wavelength of 425.55nm onto a silicon substrate. The resulting nanolines exhibit a period of 215±3nm with height of 1nm.