Microstructure and Electron Conduction Mechanism of Hydrogenated Nano-crystalline Silicon Films

The hydrogenated nano-crystalline silicon (nc-Si:H) films have deposited with plasma enhanced chemical vapor deposition method. The microstructure of these films has been studied by transmission electron microscopy and high resolution transmission electron microscopy. The nc-Si H films show fiber texture structure. The fractal dimension of this structure has been calculated with a Fourier filtered image. The relationship between conductivity and temperature has also been studied and the mechanism of electron conduction is discussed.