Vacancy-Type Defects in Neutron-Irradiated Silicon
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Abstract
Positron annihilation measurements show that the radiation defects and secondary defects in neutron-transmutation-doped (NTD) Si irradiated by two neutron doses can be removed at 600-650°C. The concentration and annealing behavior of V-type and V2 defects are related to the neutron doses. V4 appears at 150°C and 450°C - 550°C in NTD Si irradiated by higher neutron dose.
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Cite this article:
MENG Xiangti. Vacancy-Type Defects in Neutron-Irradiated Silicon[J]. Chin. Phys. Lett., 1993, 10(10): 605-608.
MENG Xiangti. Vacancy-Type Defects in Neutron-Irradiated Silicon[J]. Chin. Phys. Lett., 1993, 10(10): 605-608.
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MENG Xiangti. Vacancy-Type Defects in Neutron-Irradiated Silicon[J]. Chin. Phys. Lett., 1993, 10(10): 605-608.
MENG Xiangti. Vacancy-Type Defects in Neutron-Irradiated Silicon[J]. Chin. Phys. Lett., 1993, 10(10): 605-608.
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