Tilted Angle Implantation of Xe Ions in potassium Titanyl Phosphate
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Abstract
200keV Xe ions were implanted in potassium titanyl phosphate (KTP) at deferent angles: 0°, 45° and 60°. The lateral spread of Xe ions in KTP was studied by Rutherford backscattering of 2.1 MeV He ions. The result is compared with the theoretical prediction. The lateral spread is found in good agreement with calculated value within 17 %.
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WANG Keming, SHI Borong, WANG Zhonglie, ZHAO Qingtai, LIU Xiangdong, LIU Jitian, LIU Yaogang. Tilted Angle Implantation of Xe Ions in potassium Titanyl Phosphate[J]. Chin. Phys. Lett., 1991, 8(5): 244-247.
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WANG Keming, SHI Borong, WANG Zhonglie, ZHAO Qingtai, LIU Xiangdong, LIU Jitian, LIU Yaogang. Tilted Angle Implantation of Xe Ions in potassium Titanyl Phosphate[J]. Chin. Phys. Lett., 1991, 8(5): 244-247.
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WANG Keming, SHI Borong, WANG Zhonglie, ZHAO Qingtai, LIU Xiangdong, LIU Jitian, LIU Yaogang. Tilted Angle Implantation of Xe Ions in potassium Titanyl Phosphate[J]. Chin. Phys. Lett., 1991, 8(5): 244-247.
|
WANG Keming, SHI Borong, WANG Zhonglie, ZHAO Qingtai, LIU Xiangdong, LIU Jitian, LIU Yaogang. Tilted Angle Implantation of Xe Ions in potassium Titanyl Phosphate[J]. Chin. Phys. Lett., 1991, 8(5): 244-247.
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