THE GROWTH OF e-BEAM EVAPORATED POLYCRYSTALLINE NICKEL FILM
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Abstract
The growth of nickel polycrystals in the e-beam evaporated Ni film was studied by electron diffraction and TEM image. The in-situ resistance measurements of Ni film deposited on different substrates show the minimum thickness to form a continuous Ni superficial layer.
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ZHENG Tianshui, SHEN Yuanhua, WANG Wencheng, ZHANG Zhiming, WANG Zhijiang. THE GROWTH OF e-BEAM EVAPORATED POLYCRYSTALLINE NICKEL FILM[J]. Chin. Phys. Lett., 1989, 6(8): 377-380.
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ZHENG Tianshui, SHEN Yuanhua, WANG Wencheng, ZHANG Zhiming, WANG Zhijiang. THE GROWTH OF e-BEAM EVAPORATED POLYCRYSTALLINE NICKEL FILM[J]. Chin. Phys. Lett., 1989, 6(8): 377-380.
|
ZHENG Tianshui, SHEN Yuanhua, WANG Wencheng, ZHANG Zhiming, WANG Zhijiang. THE GROWTH OF e-BEAM EVAPORATED POLYCRYSTALLINE NICKEL FILM[J]. Chin. Phys. Lett., 1989, 6(8): 377-380.
|
ZHENG Tianshui, SHEN Yuanhua, WANG Wencheng, ZHANG Zhiming, WANG Zhijiang. THE GROWTH OF e-BEAM EVAPORATED POLYCRYSTALLINE NICKEL FILM[J]. Chin. Phys. Lett., 1989, 6(8): 377-380.
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