THE BEHAVIOR OF H AT THE AMORPHOUS SEMICONDUCTOR MULTILAYER INTERFACES
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Abstract
The H evolution spectra of a-Si:H/a-SiNx:H and a-Si:H/a-Si:H multilayers are reported. It is found that interface H evolution occurs at a higher temperature, which suggests that the interface-bonded H state is different from the bulk one.
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Cite this article:
WANG Shulin, CHENG Ruguang. THE BEHAVIOR OF H AT THE AMORPHOUS SEMICONDUCTOR MULTILAYER INTERFACES[J]. Chin. Phys. Lett., 1988, 5(2): 49-52.
WANG Shulin, CHENG Ruguang. THE BEHAVIOR OF H AT THE AMORPHOUS SEMICONDUCTOR MULTILAYER INTERFACES[J]. Chin. Phys. Lett., 1988, 5(2): 49-52.
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WANG Shulin, CHENG Ruguang. THE BEHAVIOR OF H AT THE AMORPHOUS SEMICONDUCTOR MULTILAYER INTERFACES[J]. Chin. Phys. Lett., 1988, 5(2): 49-52.
WANG Shulin, CHENG Ruguang. THE BEHAVIOR OF H AT THE AMORPHOUS SEMICONDUCTOR MULTILAYER INTERFACES[J]. Chin. Phys. Lett., 1988, 5(2): 49-52.
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