THE STAEBLER-WRONSKI EFFECT IN MICROCRYSTALLINE SILICON FILMS
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Abstract
Light-induced dark- and photoconductivity changes (so-called SWE) have been investigated on GD undoped microcrystalline Si:H(μc-Si:Hl). The SWE decreases and reaches vanishirö as the grain size increases. An interpretation for the two-phase structure and the contribution of grain boundary defects is given.
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LIU Xiangna, XU Mingde. THE STAEBLER-WRONSKI EFFECT IN MICROCRYSTALLINE SILICON FILMS[J]. Chin. Phys. Lett., 1986, 3(2): 73-76.
LIU Xiangna, XU Mingde. THE STAEBLER-WRONSKI EFFECT IN MICROCRYSTALLINE SILICON FILMS[J]. Chin. Phys. Lett., 1986, 3(2): 73-76.
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LIU Xiangna, XU Mingde. THE STAEBLER-WRONSKI EFFECT IN MICROCRYSTALLINE SILICON FILMS[J]. Chin. Phys. Lett., 1986, 3(2): 73-76.
LIU Xiangna, XU Mingde. THE STAEBLER-WRONSKI EFFECT IN MICROCRYSTALLINE SILICON FILMS[J]. Chin. Phys. Lett., 1986, 3(2): 73-76.
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