Preparation of Nano-Graphite Films and Field Emission Properties

Nano-graphite films have been deposited on n-Si substrates by microwave plasma chemical vapour deposition. The surface morphology and microstructure of the films were tested by scanning electron microscopy, x-ray diffraction and Raman spectroscopy. In the field emission measurement, a turn-on field of 0.5 V/μm and a high emission-site density of 10⁵/cm² on a tested emission area of (34 x 35 mm²) have been obtained.