Photoluminescence of Dislocations in Nitrogen Doped Czochralski Silicon
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Abstract
We investigate optical properties of dislocations in nitrogen-doped and nitrogen-free Czochralski silicon. The dislocations are formed during crystal growth, but not formed during deformation. The results show that in nitrogen-doped samples, a broad band replaced the D1 band of dislocation, regardless of dislocation density. The replacement of D1 band is caused by the non-irradiation combination induced by oxygen precipitation. Moreover, a new emission at 0.975eV is observed in both the nitrogen-free and doped samples when the dislocation density is lower than 104 cm-2.
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LI Dong-Sheng, YANG De-Ren, E. Leoni, S. Binetti, S. Pizzini. Photoluminescence of Dislocations in Nitrogen Doped Czochralski Silicon[J]. Chin. Phys. Lett., 2004, 21(11): 2242-2244.
LI Dong-Sheng, YANG De-Ren, E. Leoni, S. Binetti, S. Pizzini. Photoluminescence of Dislocations in Nitrogen Doped Czochralski Silicon[J]. Chin. Phys. Lett., 2004, 21(11): 2242-2244.
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LI Dong-Sheng, YANG De-Ren, E. Leoni, S. Binetti, S. Pizzini. Photoluminescence of Dislocations in Nitrogen Doped Czochralski Silicon[J]. Chin. Phys. Lett., 2004, 21(11): 2242-2244.
LI Dong-Sheng, YANG De-Ren, E. Leoni, S. Binetti, S. Pizzini. Photoluminescence of Dislocations in Nitrogen Doped Czochralski Silicon[J]. Chin. Phys. Lett., 2004, 21(11): 2242-2244.
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