Optical Field Measurement of Nano-Apertures with a Scanning Near-Field Optical Microscope
-
Abstract
We investigate optical near-field distributions of the unconventional C-apertures and the conventional square apertures in preliminary experiment with an aperture scanning near-field optical microscope. These nano-apertures are fabricated in Au film on a glass substrate with focused ion beam technology. The experimental results indicate the uptrend of output light intensity that a C-aperture enables the intensity maximum to increase at least 10 times more than a square aperture with same unit length. The measured near-field light spot sizes of C-aperture and square aperture with 200-nm unit length are 439nm×500nm and 245nm×216nm, respectively.
Article Text
-
-
-
About This Article
Cite this article:
XU Tie-Jun, XU Ji-Ying, WANG Jia, TIAN Qian. Optical Field Measurement of Nano-Apertures with a Scanning Near-Field Optical Microscope[J]. Chin. Phys. Lett., 2004, 21(8): 1644-1647.
XU Tie-Jun, XU Ji-Ying, WANG Jia, TIAN Qian. Optical Field Measurement of Nano-Apertures with a Scanning Near-Field Optical Microscope[J]. Chin. Phys. Lett., 2004, 21(8): 1644-1647.
|
XU Tie-Jun, XU Ji-Ying, WANG Jia, TIAN Qian. Optical Field Measurement of Nano-Apertures with a Scanning Near-Field Optical Microscope[J]. Chin. Phys. Lett., 2004, 21(8): 1644-1647.
XU Tie-Jun, XU Ji-Ying, WANG Jia, TIAN Qian. Optical Field Measurement of Nano-Apertures with a Scanning Near-Field Optical Microscope[J]. Chin. Phys. Lett., 2004, 21(8): 1644-1647.
|