Dielectric Characterization of Free-Standing Diamond Films
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Abstract
The dielectric properties of free-standing diamond films grown by the dc arc-jet plasma method are measured by an impedance analyser in the temperature range of 298-573 K and at frequencies between 1000 Hz and 1 MHz. In the temperature and frequency ranges, the loss tangent can be expressed as a function of temperature and frequency. The loss tangent increases slightly with increasing temperature and frequency. The dielectric properties of the diamond films decrease with the increasing deposited temperature. The structure and quality of diamond films have been analysed by scanning electron microscopy, x-ray diffraction and Raman spectroscopy.
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ZHANG Heng-Da, CHEN Guang-Chao, LI Cheng-Ming, TANG Wei-Zhong, LÜ Fan-Xiu. Dielectric Characterization of Free-Standing Diamond Films[J]. Chin. Phys. Lett., 2002, 19(11): 1695-1696.
ZHANG Heng-Da, CHEN Guang-Chao, LI Cheng-Ming, TANG Wei-Zhong, LÜ Fan-Xiu. Dielectric Characterization of Free-Standing Diamond Films[J]. Chin. Phys. Lett., 2002, 19(11): 1695-1696.
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ZHANG Heng-Da, CHEN Guang-Chao, LI Cheng-Ming, TANG Wei-Zhong, LÜ Fan-Xiu. Dielectric Characterization of Free-Standing Diamond Films[J]. Chin. Phys. Lett., 2002, 19(11): 1695-1696.
ZHANG Heng-Da, CHEN Guang-Chao, LI Cheng-Ming, TANG Wei-Zhong, LÜ Fan-Xiu. Dielectric Characterization of Free-Standing Diamond Films[J]. Chin. Phys. Lett., 2002, 19(11): 1695-1696.
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