Ionizing Dose Effect of Thermal Oxides Implanted with Si⁺ Ions

Total ionizing dose effects of Si⁺ ion implanted thermal oxides are studied by 10keV x-ray irradiation. Photoluminescence (PL) method is engaged to investigate nanostructures of samples. Ar⁺ implanted samples are also studied by the same way to provide a comparison. The results show that Si⁺ implantation following with high temperature annealing can significantly reduce the radiation induced flatband shift, which is caused by net positive charge accumulation in oxides. This reduction is attributed to the formation of Si nanoscale structures. Ar⁺ implantation is also found to reduce the radiation induced flatband shift, while it is different that the reduction with Si⁺ implantation shows little dependence on implant dose of Ar⁺ ions. This is explained by possible increase of recombination centres.