Metal-Organic Chemical Vapor Deposition Growth of GaAs.AIAs Double Barrier Resonant Tunneling Diode
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Abstract
We have growth two structures of AIAs/GaAs/AIAs double barrier resonant tunneling diodes by metal-organic chemical vapor deposition. The resonances to the first excited states were obtained, the measured peak-to-valley current ratio is 1.3 at 77K, room temperature peak current is 8kA/cm2, the resonance voltages are in agreement with the theoretical approach by transfer-matrix method.
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REN Hongwen, HUANG Baibiao, XU Xiangang, LIU Shiwen, JIANG Minhua, YU Shuqin. Metal-Organic Chemical Vapor Deposition Growth of GaAs.AIAs Double Barrier Resonant Tunneling Diode[J]. Chin. Phys. Lett., 1992, 9(5): 258-261.
REN Hongwen, HUANG Baibiao, XU Xiangang, LIU Shiwen, JIANG Minhua, YU Shuqin. Metal-Organic Chemical Vapor Deposition Growth of GaAs.AIAs Double Barrier Resonant Tunneling Diode[J]. Chin. Phys. Lett., 1992, 9(5): 258-261.
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REN Hongwen, HUANG Baibiao, XU Xiangang, LIU Shiwen, JIANG Minhua, YU Shuqin. Metal-Organic Chemical Vapor Deposition Growth of GaAs.AIAs Double Barrier Resonant Tunneling Diode[J]. Chin. Phys. Lett., 1992, 9(5): 258-261.
REN Hongwen, HUANG Baibiao, XU Xiangang, LIU Shiwen, JIANG Minhua, YU Shuqin. Metal-Organic Chemical Vapor Deposition Growth of GaAs.AIAs Double Barrier Resonant Tunneling Diode[J]. Chin. Phys. Lett., 1992, 9(5): 258-261.
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