Growth and Characterization of Cu2O Films Made by Rapid Thermal Oxidation Technique
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Abstract
Cu2O thin films with (111) preferred orientation have been grown on glass and Cu substrates by rapid thermal oxidation of Cu at 500°C for 45s. The optical band gap energy was determined by spectral data of transmittance and absorbance to be 2.04eV. The electrical conductivity of grown films was measured around (1.1×10-5Ω-1cm-1) at 300K. Thermoelectric power measurements of the film were carried out. Furthermore, the properties of these films are compared with properties of Cu2O obtained by other methods.
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Cite this article:
Raid A. Ismail, Ibrahim Ramadhan, Aseel Mustafa. Growth and Characterization of Cu2O Films Made by Rapid Thermal Oxidation Technique[J]. Chin. Phys. Lett., 2005, 22(11): 2977-2979.
Raid A. Ismail, Ibrahim Ramadhan, Aseel Mustafa. Growth and Characterization of Cu2O Films Made by Rapid Thermal Oxidation Technique[J]. Chin. Phys. Lett., 2005, 22(11): 2977-2979.
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Raid A. Ismail, Ibrahim Ramadhan, Aseel Mustafa. Growth and Characterization of Cu2O Films Made by Rapid Thermal Oxidation Technique[J]. Chin. Phys. Lett., 2005, 22(11): 2977-2979.
Raid A. Ismail, Ibrahim Ramadhan, Aseel Mustafa. Growth and Characterization of Cu2O Films Made by Rapid Thermal Oxidation Technique[J]. Chin. Phys. Lett., 2005, 22(11): 2977-2979.
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