Reactive Sputter Deposition of Carbon Nitride Films by Using Hollow-Cathode Discharge
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Abstract
Carbon nitride films have been prepared by reactive sputtering using hollow cathode discharge. Auger spectra show that the nitrogen content is about 20-25at.% in the bulk. Infrared (IR) spectra display three broad absorption bands. After heating treatment, changes of IR spectra suggest that the nitrogen incorporating in the bonding network of amorphous is thermally stable and hydrogen content decreases.
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ZHAO Jing, KANG Ning, XU Ji-ren. Reactive Sputter Deposition of Carbon Nitride Films by Using Hollow-Cathode Discharge[J]. Chin. Phys. Lett., 1996, 13(4): 305-308.
ZHAO Jing, KANG Ning, XU Ji-ren. Reactive Sputter Deposition of Carbon Nitride Films by Using Hollow-Cathode Discharge[J]. Chin. Phys. Lett., 1996, 13(4): 305-308.
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ZHAO Jing, KANG Ning, XU Ji-ren. Reactive Sputter Deposition of Carbon Nitride Films by Using Hollow-Cathode Discharge[J]. Chin. Phys. Lett., 1996, 13(4): 305-308.
ZHAO Jing, KANG Ning, XU Ji-ren. Reactive Sputter Deposition of Carbon Nitride Films by Using Hollow-Cathode Discharge[J]. Chin. Phys. Lett., 1996, 13(4): 305-308.
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