Blue Light Emission from Hydrogenated Amorphous Silicon CarbidePrepared by Xylene Source in Plasma-Enhanced Chemical Vapour Deposition System

We chose xylene C₈H₁₀ as carbon source instead of conventional methane CH₄ to fabricate a-Si_l-xC_x: H films using plasma-enhanced chemial vapour deposition method. The optical band gap of this material could be widened to 3.1eV. And the infrared absorption spectra of our films manifest the existence of aromatic ring in them. Strong blue light emission with a peak wavelength of 490nm has been observed at room temperature.