Structural and Electrical Properties of Amorphous Hydrogen Carbon-Nitrogen Films
-
Abstract
Amorphous hydrogenated carbon-nitrogen (a-C:H:(N)) films with different nitrogen contents have been deposited by using rf-sputtering of a high purity graphite target in an Ar-H2-N2 atmosphere. Transmittance and reflectance spectra are used to characterize the Tauc gap and absorption coefficients in the wavelength range 0.185-3.2μm. The temperature dependence of conductivity demonstrates a hopping mechanism of the Fermi level in the temperature range of 77-300 K. The density of state at the Fermi level is derived from the direct current conductivity. The photoluminescence properties of a-C:H:N films were investigated. The photoluminescence peak has a blue shift with increasing excitation energy. These results are discussed on the basis of a model in which the different sp2 clusters dispersed in sp3 matrices.
Article Text
-
-
-
About This Article
Cite this article:
SUO Da-Cheng, LIU Yi-Chun, LIU Yan, QI Xiu-Ying, ZHONG Dian-Qiang. Structural and Electrical Properties of Amorphous Hydrogen Carbon-Nitrogen Films[J]. Chin. Phys. Lett., 2004, 21(2): 400-402.
SUO Da-Cheng, LIU Yi-Chun, LIU Yan, QI Xiu-Ying, ZHONG Dian-Qiang. Structural and Electrical Properties of Amorphous Hydrogen Carbon-Nitrogen Films[J]. Chin. Phys. Lett., 2004, 21(2): 400-402.
|
SUO Da-Cheng, LIU Yi-Chun, LIU Yan, QI Xiu-Ying, ZHONG Dian-Qiang. Structural and Electrical Properties of Amorphous Hydrogen Carbon-Nitrogen Films[J]. Chin. Phys. Lett., 2004, 21(2): 400-402.
SUO Da-Cheng, LIU Yi-Chun, LIU Yan, QI Xiu-Ying, ZHONG Dian-Qiang. Structural and Electrical Properties of Amorphous Hydrogen Carbon-Nitrogen Films[J]. Chin. Phys. Lett., 2004, 21(2): 400-402.
|