THE MECHANISM OF SURFACE SEGREGATION BY THE METHOD OF MECHANICAL POLISHING
-
Abstract
Mechanical polishing and subsequent thermal oxidation are the indispensable condition for rapid formation of a continuous and highly Cr-enriched layer on the surface of a Ni-Cr alloy. Direct observations of the Cr distribution on the surface by Auger map show a possible process for Cr segregation. The huge amount of grain boundaries created by mechanical polishing promote the upward diffusion of Cr. Selective oxidation and Cr-holding effect also speed up the formation of Cr2O3.
Article Text
-
-
-
About This Article
Cite this article:
CHEN Naiqun, ZHANG Qiangji, HUA Zhongyi. THE MECHANISM OF SURFACE SEGREGATION BY THE METHOD OF MECHANICAL POLISHING[J]. Chin. Phys. Lett., 1986, 3(3): 129-132.
CHEN Naiqun, ZHANG Qiangji, HUA Zhongyi. THE MECHANISM OF SURFACE SEGREGATION BY THE METHOD OF MECHANICAL POLISHING[J]. Chin. Phys. Lett., 1986, 3(3): 129-132.
|
CHEN Naiqun, ZHANG Qiangji, HUA Zhongyi. THE MECHANISM OF SURFACE SEGREGATION BY THE METHOD OF MECHANICAL POLISHING[J]. Chin. Phys. Lett., 1986, 3(3): 129-132.
CHEN Naiqun, ZHANG Qiangji, HUA Zhongyi. THE MECHANISM OF SURFACE SEGREGATION BY THE METHOD OF MECHANICAL POLISHING[J]. Chin. Phys. Lett., 1986, 3(3): 129-132.
|