Adsorption of CH3OD on Si(ll1) Surface at Different Temperatures
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Abstract
Adsorption of deuterated methanol (CH3 OD) on Si ( 111 ) surface has been studied at different temperatures by means of thermal desorption spectroscopy. For the adsorption temperature below 420°C, the desorption peak of hydrogen kept up almost unchanged at 510°C (±70°C). But the desorption peak temperature of hydrogen increased obviously for the adsorption temperature above 420°C. We have also found an interesting change in desorption energy of hydrogen.
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WANG Zhuying, HUANG Hongwu, T. Hein, K. D. Brzoska. Adsorption of CH3OD on Si(ll1) Surface at Different Temperatures[J]. Chin. Phys. Lett., 1991, 8(4): 199-202.
WANG Zhuying, HUANG Hongwu, T. Hein, K. D. Brzoska. Adsorption of CH3OD on Si(ll1) Surface at Different Temperatures[J]. Chin. Phys. Lett., 1991, 8(4): 199-202.
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WANG Zhuying, HUANG Hongwu, T. Hein, K. D. Brzoska. Adsorption of CH3OD on Si(ll1) Surface at Different Temperatures[J]. Chin. Phys. Lett., 1991, 8(4): 199-202.
WANG Zhuying, HUANG Hongwu, T. Hein, K. D. Brzoska. Adsorption of CH3OD on Si(ll1) Surface at Different Temperatures[J]. Chin. Phys. Lett., 1991, 8(4): 199-202.
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