Investigation of Preparing Cubic Boron Nitride Films by Magnetron Arc-Discharge Plasma Ion Plating

A method of synthesizing cubic boron nitride (c-BN) films by the magnetron arc-discharge plasma ion plating was investigated. A nearly pure c-BN film was obtained by reacting boron vapor with high-density nitrogen ions, and using hot cathode arc-discharge plasma in a parallel magnetic field around the substrate. The structure of the films obtained was characterized by using infrared absorption spectroscopy and x-ray diffraction analysis. After numerous experiments, the phase pattern of the bias vs the current in synthesizing c-BN was found.