Adsorption and Thermal Decomposition of SiH4₄ on Cu(111) by Multiple-Scattering Cluster Method

Adsorption and thermal decomposition of SiH₄ on Cu(111) at 110 K has been studied by the calculation of silicon K-edge near edge x-ray absorption fine structure spectra using multiple-scattering cluster method. It is found that the cleavage of Si-H bond yields SiH₃ species adsorbed on the fcc 3-fold hollow sites on Cu (111) surface at 110K .